Engineering: Semiconductor

Latest Innovations

Highly Reflective Interface for Distributed Bragg Reflectors (DBRs)

 

Distributed Bragg Reflectors (DBRs) are a fundamental component of optical devices requiring an optical gain, such as various types of semiconductor lasers....

High Strength Low-k Insulators

 

A polymer comprises at least two types of monomer units selected from: (1) diethynyl benzene units, (2) triethynyl benzene units, and (3) ester units. After curing...

Sub-10 nm fabrication: molecular templating, electron-beam sculpting and crystallization of metallic nanowires

 

This technology provides a technique for fabricating metallic structures with dimensions considerably smaller than 10 nm and the use of a focused electron beam to...

Method For Fabricating Complex Micro and Nanoscale Electronic Structures by Sub Pixel-voting Lithography and Devices Made by Same

 

This invention provides processing steps, methods and materials strategies for making patterns of structures for electronic, optical and optoelectronic devices....

Method for Fabricating Dual Damascene Profiles

 

This invention provides processing steps, methods and materials strategies for making patterns of structures for integrated electronic devices and systems....

Curved Coupled Waveguide Array

 

A semiconductor laser that includes an active region, claddings and electrical contacts to stimulate emissions from the active region, where a coupled waveguide...

Direct Nanoscale Patterning of Metals Using Polymer Electrolytes

 

Electrochemical fabrication platforms for making structures, arrays of structures and functional devices having selected nanosized and/or microsized physical...

Material Assisted Laser Ablation

 

This invention provides photoablation--based processing techniques and materials strategies for making, assembling and integrating patterns of materials for the...

Mirror Arrays for Maskless Photolithography and Image Display

 

This invention is a class of micromirrors with high reflectivity dielectric layer coated on top of micromirror that can be tuned to allow transparency or...

Highly Controllable ICP Low Rate Etching of Gallium-Based III-V Semiconductor Materials

 

A method of plasma etching Ga-based compound semiconductors includes providing a process chamber and a source electrode adjacent to the process chamber. The...

Pages