MacEtch for Ge and β-Ga2O3

Dr. Li from the University of Illinois at Urbana-Champaign has developed Metal assisted Etching (MacEtch) to fabricate structure and texture on Ge and β-Ga2O3EtThe optoelectronic devices made by this method show improvement in both optical and electrical property.

Related Publications:

  • Kim et al., "Scaling the Aspect Ratio of Nanoscale Closely Packed Silicon Vias by MacEtch: Kinetics of Carrier Generation and Mass Transport," Adv. Funct. Mat., 2017