This metal-assisted chemical etching (MacEtch) technology can be used to fabricate structure and texture on Ge and β-Ga2O3Et. The optoelectronic devices made by this method show improvement in both optical and electrical properties.
- Kim et al., "Scaling the Aspect Ratio of Nanoscale Closely Packed Silicon Vias by MacEtch: Kinetics of Carrier Generation and Mass Transport," Adv. Funct. Mat., 2017