Engineering: Semiconductor

Latest Innovations

Fabrication of Microfluidic Systems and Components Using Light Initiated Polymerization

 

An innovative, cost-effective method for making and integrating fluidic microchannels. This method for ultra-rapid prototyping of microfluidic systems requiring...

Aligned Free-Standing Copper Nanowires

 

This invention fabricates copper nanowires using thermal chemical vapor deposition (CVD) at temperatures of about 200 to 400 C. The method can produce vertically...

Transistor Quantum Cascade Laser

 

A method for producing light emission, including the following steps: providing a transistor structure that includes a semiconductor base region disposed between...

Mirror Arrays for Maskless Photolithography and Image Display

 

This invention is a class of micromirrors with high reflectivity dielectric layer coated on top of micromirror that can be tuned to allow transparency or...

Thin Film Wafer Bonding

 

Amorphous and polycrystalline III-V semiconductor including (Ga,As), (Al,As), (In,As), (Ga,N), and (Ga,P) materials were grown at low temperatures on...

Generator of Atom Clusters

 

An apparatus and a method for producing atom clusters based on a gas discharge within a hollow cathode. The hollow cathode includes one or more walls. The one or...

High Strength Low-k Insulators

 

A polymer comprises at least two types of monomer units selected from: (1) diethynyl benzene units, (2) triethynyl benzene units, and (3) ester units. After...

Ultrathin Dielectric Oxide Films for Improved Passivation of Superconducting Materials

 

This technology is a method of fabricating an oxide layer on the surface of a high-temperature (high Tc) superconductor. The oxide layer passivates the...

Material Assisted Laser Ablation

 

This invention provides photoablation--based processing techniques and materials strategies for making, assembling and integrating patterns of materials for the...

Highly Controllable ICP Low Rate Etching of Gallium-Based III-V Semiconductor Materials

 

A method of plasma etching Ga-based compound semiconductors includes providing a process chamber and a source electrode adjacent to the process chamber. The...

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