Method to form a thin film depositions


Inventors from the University of Illinois have developed a method to form thin film depositions from a variety of sources, using Vacuum UV light.

This low temperature method is fast and allows for a low defect and uniform film deposition on almost any surface. Moreover it is capable of forming films from vapor, solid and liquid precursors.

Applications include mioelectronics, optoelectronics, semiconductor surface and metals passivation, coating of materials with low melting point, dielectric materials, and potentially hydraulic rams to prevent oxidation of materials.