NatOx is a well-known, proven, and patented technology that enables the formation of high-quality oxide layers on compound semiconductors, leading to improved performance and lower costs for optoelectronic and microelectronic devices.
Oxides provide crucial functions in semiconductors, including masking, passivation, isolation, and other more active functions. Although long available for silicon-based devices, a native (as opposed to deposited) oxide was not available for Group III-V semiconductors.