Processes

Latest Innovations

Silicone Microspheres by Ultrasonic Spray Pyrolysis

 

Dr. Suslick from the University of Illinois has a method of facbricating silicone microspheres using ultrasonic spray pyrolysis, providing the first scalable...

Cobalt Precursors For Formation of Cobalt or Cobalt-Containing Material

 

Chemical vapor deposition (CVD) of cobalt requires a cobalt precursor that can be easily vaporized, leaving high-purity cobalt on a surface while causing no...

Method for Growing a Polarization Free GaN-Based Laser Diode

Prof. Bayram from the University of IL has developed a method of depositing (growing) GaN on silicon substrates with complete surface coverage of cubic phase GaN. 
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MacEtch Method Using CMOS Compatible catalyst TiN

 

 

Dr. Xiuling Li from the University of IL has developed a new MacEtch method using TiN as the metal catalyst. Compared with conventional MacEtch catalysts,...

Polarization Dependent Damage-Free Laser-Assisted Plasma Etching

Drs. David Ruzic and Jason Peck from the University of Illinois at Urbana-Champaign have developed a new plasma etching process assisted by a polarized pulsed laser. This...

Carbon Nanotube Portfolio for Manufacturing Applications

This portfolio includes carbon nanotube growth and processing methods relevant to nanotube manufacturing....

Suite of Bioresorbable and Transient Electronics

Optical Inspection of Nanoscale Structures using a Novel Machine Learning Based Synthetic Image Generation Algorithm

Semiconductor defect detection using Machine Learning

Dr. Goddard and Dr. Schwing have developed a machine learning technique which requires only...

Method To Produce Nanoscale 3D Porous Silicon Patterns and Applications

This method of forming a nanoscale three-dimensional pattern in a porous semiconductor includes providing a film comprising a semiconductor material and defining a...

III-V Metal Assisted Chemical Etching to Produce High Aspect Ratio III-V Semiconductor Nanostructures 

This technology is a new method for creating high aspect ratio III-V semiconductor nanostructures. Unlike currently used commercial technologies, this method does not...

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